High-k Gate Dielectrics for CMOS Technology

He, Gang; Sun, Zhaoqi

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.

Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Details

Published by: Wiley-VCH

Publication Date: 2012-10-15

Format: Hardcover

ISBN-13: 9783527330324

DOI:

Dimensions: 246.4cm x172.7cm

Pages: 590.0