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Chemical Solution Deposition of Functional Oxide Thin Films

Chemical Solution Deposition of Functional Oxide Thin Films

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Chemical Solution Deposition of Functional Oxide Thin Films

Schneller, Theodor; Waser, Rainer; Kosec, Marija; Payne, David

This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

Details

Published by: Springer

Publication Date: 2014-02-04

Format: Hardcover

ISBN-13: 9783211993101

DOI: 10.1007/978-3-211-99311-8

Dimensions: 235cm x155cm

Pages: 796

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