NanoScience and Technology

Shim, Seongbo; Shin, Youngsoo

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Details

Published by: Springer

Publication Date: 2019-02-08

Format: Paperback

ISBN-13: 9783030094553

DOI: 10.1007/978-3-319-76294-4

Dimensions: 235cm x155cm

Pages: 138